Semiconductor Physics, Quantum Electronics & Optoelectronics. 2010. V. 13, N 1. P. 019-023.


ITO layers modified in glow discharge plasma for Nematic Liquid Crystal alignment
Yu. Kolomzarov, P. Oleksenko, A. Rybalochka, V. Sorokin, P. Tytarenko, R. Zelinskyy

V. Lashkaryov Institute of Semiconductor Physics, NAS of Ukraine, 41, prospect Nauky, 03028 Kyiv, Ukraine; e-mail: zelinski@isp.kiev.ua

Abstract. Influence of ionic and plasma treatment on orienting properties of indium-tin- oxide (ITO) films was investigated. The stable tilt angle generation of nematic liquid crystal (NLC) molecules was attended. Dependences of NLC molecules tilt angles on various technological parameters and regimes of ITO film deposition have been shown. Results for oriented film surfaces investigated by atomic-force microscopy showed the viscous-elastic mechanism of NLC molecules alignment by the modified ITO films.

Keywords: molecular orientation, reactive cathode sputtering, aligned structures, ITO films.

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