Semiconductor Physics, Quantum Electronics & Optoelectronics. 2011. V. 14, N 1. P. 059-061.

Optical properties of ion implanted thin Ni films on lithium niobate
V.O. Lysiuk 1,2 , V.S. Staschuk 2 , I.G. Androsyuk 1 , N.L. Moskalenko 1

1V. Lashkariov Institute of Semiconductor Physics, NAS of Ukraine, 41, prospect Nauky, 03022 Kyiv, Ukraine
2Taras Shevchenko Kyiv National University, Department of Physics, 2, prospect Glushkova, 03022 Kyiv, Ukraine E-mail:

Abstract. Ion implantation by keV Ar + ions creates blisters on the surface of thin Ni films deposited on lithium niobate and causes changes in optical properties and structure of Ni film and lithium niobate substrate. Processes of ion implantation and effects of increasing absorption, adhesion, damage threshold are described and explained in the paper. Development of pyroelectric photodetector “thin Ni film – lithium niobate” is proposed.

Keywords: ion implantation, thin Ni films, lithium niobate, optical properties.

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