Semiconductor Physics, Quantum Electronics & Optoelectronics. 2014. V. 17, N 1. P. 052-055.
High-density data recording via laser thermo-lithography
and ion-beam etching
1Institute for Information Recording of National Academy of Science of Ukraine
2, str. M. Shpaka, 03113, Kiev, Ukraine
Abstract. Pits 250 - 300 - nm wide were obtained on the surface of thin organic nanocomposite film using master-disc laser-burning station with 405 nm laser beam focused by 0.85 NA lens. The film with obtained pits was used as a mask for subsequent reactive ion-beam etching of glass substrate. Finally, 150 - 200-nm pits were performed on the substrate surface. Nanocomposite films were based on organic positive photoresist with a dye inclusions. This dye is characterized by wide absorption band within the spectral region 390-410 nm and can be evaporated by laser irradiation with the wavelength 405 nm.
Keywords:optical data recording, laser thermo-lithography, organic nanocomposite films, ion-beam etching.
Manuscript received 11.12.13; revised version received 23.01.14; accepted for publication 20.03.14; published online 31.03.14.