Semiconductor Physics, Quantum Electronics and Optoelectronics, 6 (2) P. 147-152 (2003).


References

1. V.M.Babich, N.I.Bletsken, E.F.Venger Oxygen in silicon crystal, Kiyv: Interpress, 1997.
2. V.V.Litvinov, G.V.Palchyk, V.I.Urenev.O vlijanii radiatsionnyh defektov na kinetiku obrazovanija termodonorov v kremnii // FTP, 24, 2, p.376 (1990).
3. V.V.Emtsev, Yu.N.Daluda, V.I.Shachovcov and others. Kislorodosoderdhcaschije termodonary, obrazyjuschiicja v kremnii pri "horjachem" γ-obluchenii // Metallophysica, 12,4, p.374 (1990).
4. V.I.Kcrupa, I.P.Entin. K voprosu o vlijanii ul'trazvuka na intensivnost' rentgenovskih difraktsyonnyh refleksov // Metallophysica, 12, 4, p.80 (1990).
5. V.I.Kcrupa, O.V.Petrosan, I.P.Entin. Laue-dyfraktsija v akustychno zbudhsenyh crystalah kremniju, shcho mistjat' dyslokatsii // UFJ, 36, 3, p.421 (1991).
6. R.F.Vitman, N.B.Guseyev, A.A.Lebedev and others. Vzaimosvjas' strukturno-chustvitel'nych svojstv s geneticheskimi osobennostjami monokristalovkremnija // FTT, 36, 3, p.697 (1994).
7. D.O.Grygoryev, V.I.Khrupa, L.I.Datsenko, V.F.Machulin, K voprosu o vlijanii kombinirovanohyh iskadhsiy structury na dinamicheskuju difraktsiju renthenovskih luchey // Metal.and Adv. Tech., 18, 6, p.47 (1996).
8. K.V.Chuistov. Nachalnije stadii raspada peresyshennija tverdyh rastvorov // Metal. and Adv. Tech., 17, 4, p.7 (1995).