Semiconductor Physics, Quantum Electronics & Optoelectronics, 4 (3), P. 177-181 (2001)
https://doi.org/10.15407/spqeo4.03.177


Semiconductor Physics, Quantum Electronics & Optoelectronics. 2001. V. 4, N 3. P. 177-181.

PACS: 71.25.Rk, 81.60Cp

Bolometric characteristics of macroporous
silicon structures

L.A. Karachevtseva, O.A. Lytvynenko, E.A. Malovichko, V.D. Sobolev, O.J. Stronska

Institute of Semiconductor Physics, 45 Nauki Prsp., 03028 Kyiv, Ukraine
Tel.: 265 9815, FAX: 265 8243, E-mail: kartel@mail.kar.net

Abstract. Bolometric characteristics of macroporous silicon were investigated. Ohmic structures of the type «In/n-Si» and «In/macroporous n-Si» were formed by thermal evaporation of indium in an atmosphere of hydrogen. Temperature dependencies of electron conductivity, concentration and mobility in macroporous silicon emulate the temperature curves of the corresponding parameters for crystalline silicon. The investigated macroporous silicon structures are promising material for multi-element thermal sensor fabrication due to a high temperature coefficient of electrical resistance (1-4%), low noise level (2*10-9 VHz-1/2) and good radiation absorption in the operation spectral region.

Keywords: macroporous silicon, electrochemical process, bolometric characteristics, thermal sensor.

Paper received 29.01.01; revised manuscript received 12.03.01; accepted for publication 13.07.01.

 
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