Semiconductor Physics, Quantum Electronics & Optoelectronics, 4 (3), P. 177-181 (2001)
https://doi.org/10.15407/spqeo4.03.177 Semiconductor Physics, Quantum Electronics & Optoelectronics. 2001. V. 4, N 3. P. 177-181. PACS: 71.25.Rk, 81.60Cp Bolometric characteristics of macroporous L.A. Karachevtseva, O.A. Lytvynenko, E.A. Malovichko, V.D. Sobolev, O.J. Stronska Institute of Semiconductor Physics, 45 Nauki Prsp., 03028 Kyiv, Ukraine Abstract. Bolometric characteristics of macroporous silicon were investigated. Ohmic structures of the type «In/n-Si» and «In/macroporous n-Si» were formed by thermal evaporation of indium in an atmosphere of hydrogen. Temperature dependencies of electron conductivity, concentration and mobility in macroporous silicon emulate the temperature curves of the corresponding parameters for crystalline silicon. The investigated macroporous silicon structures are promising material for multi-element thermal sensor fabrication due to a high temperature coefficient of electrical resistance (1-4%), low noise level (2*10-9 VHz-1/2) and good radiation absorption in the operation spectral region. Keywords: macroporous silicon, electrochemical process, bolometric characteristics, thermal sensor. Paper received 29.01.01; revised manuscript received 12.03.01; accepted for publication 13.07.01. This work is licensed under a Creative Commons Attribution-NoDerivatives 4.0 International License. |