References

Semiconductor Physics, Quantum Electronics and Optoelectronics, 5 (3) P. 316-318 (2002).

References

1. KC Aw et al, The Study of MSQ SOG as Low - K Dielectric Material used as ILD in Semiconductor Devices, MASS XVIII Sept 2001, pp. 18.

2. Filmtronics Application Notes on Spin-on Glasses (MSQ400F), Revision No. 5, June 1998.

3. Bing-Yue Tsui et al, Electrical Instability of Low-Dielectric Constant Diffusion Barrier Film (a-SiC:H) for Copper Interconnect, IEEE Trans on Electron Devices, Vol.48,No.10, Oct 2001, pp. 2376. https://doi.org/10.1109/16.954480

4. K.C. Aw et al, Comparative Study of Evaporated Aluminium and Copper on MSQ low-K Dielectric using Spin-on Method, NSM2001, Nov 2001, pp 108.

5. Alvin L.S. Loke et al, Kinetics of Copper Drift in Low-K Polymer Interlevel Dielectrics, IEEE Trans on Electron Devices, Vol.46, No.11, Nov 1999, pp. 2182-2183. https://doi.org/10.1109/16.796294