References

Semiconductor Physics, Quantum Electronics and Optoelectronics, 13 (3) P. 305-308 (2010).
DOI: https://doi.org/10.15407/spqeo13.03.305

References

1. S. Lazarouk, P. Jaguiro, V. Labunov, D. Sasinovich, A. Smirnov, A. Muravski, V. Chigrinov and H. Kwok, Anodizing technique for liquid crystal displays // SID Eurodisplay, Moscow, 2007.

2. T. Maeda and K. Hiroshima, Vertically aligned nematic liquid crystal on anodic porous alumina // Jpn. J. Appl. Phys. 43(8A), p. 1004-1006 (2004). https://doi.org/10.1143/JJAP.43.L1004

3. L. Huang, M. Saito and M. Miyagi, Polarization characteristics of alumina films anodized at low temperature // Jpn. J. Appl. Ph ys. 32(7), p. 3169-3174 (1993). https://doi.org/10.1143/JJAP.32.3169

4. V. Kochergin and H. Foell, Novel optical elements made from porous Si // Mater. Sci. and Eng.: R: Repts 52(4-6), p. 93-140 (2006). https://doi.org/10.1016/j.mser.2006.05.002

5. A. Fujishima, X. Zhang and D. Tryk, TiO2 photocatalysis and related surface phenomena // Surf. Sci. Repts 63(12), p. 515-582 (2008). https://doi.org/10.1016/j.surfrep.2008.10.001

6. K. Mor, O. Varghesea, M. Paulosec, K. Ongc and C. Grimes, Fabrication of hydrogen sensors with transparent titanium oxide nanotube-array thin films as sensing elements // Thin Solid Films 496(1), p. 42-48 (2006). https://doi.org/10.1016/j.tsf.2005.08.190

7. С. Granqvist, Oxide electrochromics: Why, how, and whither // Solar Energy Materials and Solar Cells 92(2), p. 203-208 (2008). https://doi.org/10.1016/j.solmat.2006.10.027

8. K. Knowles and V. Helvoort, Anodic bonding // Intern. Mater. Rev. 51(5), p. 273-311 (2006). https://doi.org/10.1179/174328006X102501

9. S. Park and M. Kim, Fabrication method of spacers with high aspect ratio - Used in a field emission display (FED) // Microsystem Technologies 7(1), p. 32- 35 (2001). https://doi.org/10.1007/s005420000061

10. S. Lee, M. Lee, W. Choi, D. Lee and Y. Kim, Characteristics of ACPDP test panels with aluminum fence electrode formed via anodic bonding with sodalime glass // J. SID 16/12, p. 1219-1227 (2008). https://doi.org/10.1889/JSID16.12.1219

11. M. Saito, Y. Shiga and M. Miyagi, Unoxidized aluminum particles in anodic alumina films // J. Electrochem. Soc. 140 (7), p. 1907-1911 (1993). https://doi.org/10.1149/1.2220737

12. S. Park, H. Lee, J. Cho and K. Lee, Nanoporous anodic alumina film on glass: improving transparency by an ion-drift process // Electrochem. and Solid-state Lett. 8(3), p. 5-7 (2005). https://doi.org/10.1149/1.1854771

13. M. Ikeda, T. Abe and K. Matsuo, Image forming method, process for producing decorative aluminum plate, apparatus for carrying out the process, decorative aluminum plate, and recording medium, USA Patent No. 5,786,835 (1998).

14. H. Sai, H. Fujii, K. Arafune, Y. Ohshita and M. Yamaguchi, Antireflective subwavelength structures on crystalline Si fabricated using directly formed anodic porous alumina masks // Appl. Phys. Lett. 88 (20), 201116 (2006). https://doi.org/10.1063/1.2205173

15. A. Stsiapanau, P. Jaguiro, A. Smirnov, H. Kwok, A. Murauski and Y. Jacob, Nanostructured metal transparent conductive layer and method of its self-ordered fabrication from valve metal film, USA Patent No. application 61/213,283 on 05/26/2009 (2009).