Semiconductor Physics, Quantum Electronics & Optoelectronics. 2011. V. 14, N 3. P. 273-278.
https://doi.org/10.15407/spqeo14.03.273



References 

1. A.-L. Barabasi and H.E. Stanley, Surface Growth. Cambridge University Press, Cambridge, England, 1996.
 
2. P. Meakin, Fractals, Scaling and Growth Far from Equilibrium. Cambridge University Press, New York, 1998.
 
3. N.G. Nachodkin and A.I. Shaldervan, Effect of vapour incidence angles on profile and properties of condensed films. Thin Solid Films, 10(1), p. 109-122 (1972).
https://doi.org/10.1016/0040-6090(72)90276-3
 
4. A.G. Dirks and H.J. Leamy, Columnar microstructure in vapor deposited thin films. Thin Solid Films, 47(3), p. 219-233 (1977).
https://doi.org/10.1016/0040-6090(77)90037-2
 
5. R. Messier, A.P. Giri and R.A. Roy, Revised structure zone model for thin film physical structures. J. Vac. Sci. Technol. A, 2(2), p. 500-503 (1984).
https://doi.org/10.1116/1.572604
 
6. H. van Kranenberg and C. Lodder, Tailoring growth and local composition by oblique-incidence deposition: a review and new experimental data. Mater. Sci. Eng. R, 11(7), p. 295-354 (1994).
https://doi.org/10.1016/0927-796X(94)90021-3
 
7. J.M. García-Martín, R. Alvarez, P. Romero-Gómez, A. Cebollada and A. Palmero, Tilt angle control of nanocolumns grown by glancing angle sputtering at variable argon pressures. Appl. Phys. Lett. 97(17), 173103–173103-3 (2010).
https://doi.org/10.1063/1.3506502
 
8. B. Tanto, G. Ten Eyck and T.M. Lu, A model for column angle evolution during oblique angle deposition. J. Appl. Phys. 108(2), 026107–026107-3 (2010).
https://doi.org/10.1063/1.3465296
 
9. M.V. Sopinskyy, V.I. Mynko, I.Z. Indutnyi, O.S. Lytvyn and P.E. Shepeliavyi, Surface self-ordering in obliquely deposited As2S3 films. Chalcogenide Lett. 5(11), p. 239-247 (2008).
 
10. S.R. Kennedy and M. Brett, Porous broadband antireflection coating by glancing angle deposition. J. Appl. Opt. 42(22), p. 4573-4579 (2003).
https://doi.org/10.1364/AO.42.004573
 
11. I.Z. Indutnyy, I.Yu. Maidanchuk, V.I. Min'ko, P.E. Shepeliavyi and V.A. Dan'ko, Visible photoluminescence from annealed porous SiOx films. J. Optoelectron. and Adv. Mater. 7(3), p. 1231-1236 (2005).
 
12. R.M.A. Azzam and N.M. Bashara, Ellipsometry and Polarized Light. Amsterdam, North-Holland, 1986.
 
13. B. Lecourt, D. Blaudez and J.-M. Turlet, Specific approach of generalized ellipsometry for the determination of weak in-plane anisotropy: application to Langmuir–Blodgett ultrathin films. J. Opt. Soc. Amer. A, 15(10), p. 2769-2782 (1998).
https://doi.org/10.1364/JOSAA.15.002769
 
14. Yi-Jun Jen and Cheng-Yu Peng, Narrow-band and broad-band polarization conversion reflection filters. Appl. Phys. Lett. 89(4), 041128–041128-3 (2006).
https://doi.org/10.1063/1.2243803
 
15. W. Xu, L.T. Wood and T.D. Golding, An ellipsometric method for the determination of the dielectric tensor of an optically uniaxial material suited for in-situ measurements. Thin Solid Films, 384(2), p. 276-281 (2001).
https://doi.org/10.1016/S0040-6090(00)01861-7
 
16. G. Beydaghyan, C. Buzea, Y. Cui, C. Elliott and K. Robbie, Ex situ ellipsometric investigation of nanocolumns inclination angle. Appl. Phys. Lett. 87(15), 153103–153103-3 (2005).
https://doi.org/10.1063/1.2084329
 
17. L.A. Golovan', P.K. Kashkarov and V.Yu. Timoshenko, Form birefringence in porous semiconductors and dielectrics: a review. Crystallography Repts. 52(4), p. 672-685 (2007).
https://doi.org/10.1134/S1063774507040153
 
18. M. Schubert, B. Rheinländer, J.A. Woollam, B. Johs and C.M. Herzinger, Extension of rotating-analyzer ellipsometry to generalized ellipsometry: determination of the dielectric function tensor from uniaxial TiO2. J. Opt. Soc. Amer. A, 13(4), p. 875-883 (1996).
https://doi.org/10.1364/JOSAA.13.000875
 
19. J.M. Nieuwenhuizen and H.B. Haanstra, Microfractography of thin films. Philips Tech. Rev. 27, p. 87-91 (1966).
 
20. R.N. Tait, T. Smy and M.J. Brett, Modelling and characterization of columnar growth in evaporated films. Thin Solid Films, 226(2), p. 196-201 (1993).
https://doi.org/10.1016/0040-6090(93)90378-3
 
21. V.A. Dan'ko, V.Ya. Bratus', I.Z. Indutnyi, I.P. Lisovskyy, S.O. Zlobin, K.V. Michailovska and P.E. Shepeliavyi, Control of photoluminescence spectra of porous nc-Si-SiOx structures by vapor treatment. Semiconductor Physics, Quantum Electronics & Optoelectronics, 13(3), (2010).