Semiconductor Physics, Quantum Electronics & Optoelectronics. 2015. V. 18, N 3. P. 292-296.
DOI: https://doi.org/10.15407/spqeo18.03.292


References

1. P.A. Selishchev, Self-organisation in Radiation Physics. Publ. "Aspect-Poligraph", Kyiv, 2004 (in Russian).
 
2. D.I. Tetelbaum, V.Ya. Bayankin, Long-range Effect. Priroda, 4, p. 9-17 (2005), in Russian.
 
3. V.I. Sugakov, Peculiarities of formation of implanted atom density distribution beyond ion range. Yadernaia Fizika i Energetika, 10(4), p. 395-402 (2009), in Russian.
 
4. M. Vishniakov, S.E. Donnelly, G. Carter, The influence of impurities on the growth of He induced cavities in silicon. J. Appl. Phys. 94(1), p. 238-244 (2003).
https://doi.org/10.1063/1.1576493
 
5. E. Oliviero, S. Peripolli, L. Amararal et al., Damage accumulation in neon implanted silicon. Appl. Phys. 100, 043505 (2006).
https://doi.org/10.1063/1.2220644
 
6. A.A. Groza, P.G. Litovchenko, M.I. Starchyk, Radiation Effects in IR-absorption and Structure of Silicon. Naukova dumka, Kyiv, 2006 (in Ukrainian).
 
7. M.L. Dmytruk, O.S. Kondratenko, M.B. Pinkovska et al., Optical and sensitive properties of nanostructured silicon irradiated with high-energy particles (protons, α-particles, and heavy ions). Ukr. J. Phys. 55(7), p. 808-816 (2010).
 
8. M.F. Beufort, S.E. Donnelly, S. Rousselet, M.I. David, J.F. Barbot, Extented type defects created by high temperature implantation into Si. Nucl. Inst. and Meth. in Phys. Res. B, 242, p. 565-567 (2006).
 
9. J. Nord, K. Nordlund, J. Keinonen, Amortization mechanism and defect structure in ion-beam amorphized Si, Ge, GaAs. Phys. Rev. B, 65, 165329 (2002).
https://doi.org/10.1103/PhysRevB.65.165329
 
10. A.M. Myasnikov, V.I. Obodnikov, V.G. Seryapin et al., Formation of quasi-periodic boron distribution in silicon initiated by ion implantation. Semiconductors, 31(3), p. 279-282 (1997).
https://doi.org/10.1134/1.1187127
 
11. V.I. Dubinko, A.C. Gudla, S.E. Donnelly, Radiation-induced formation, annealing and ordering of voids in crystals: Theory and experiment. Nucl. Inst. and Meth. in Phys. Res. B, 269, p. 1634-1639 (2011).