Semiconductor Physics, Quantum Electronics & Optoelectronics. 2012. V. 15, N 4. P. 328-332.
DOI: https://doi.org/10.15407/spqeo15.04.328

Perspectives for using technology of laser thermolithography
A.A. Kryuchyn1, A.S. Lapchuk1, A.I. Bryts’kyi1, S.O. Kostyukevych2

1Institute for information recording, NAS of Ukraine, 2, vul. Shpaka, 03113 Kyiv, Ukraine.
2V. Lashkaryov Institute of Semiconductor Physics, NAS of Ukraine, 41, Prospect Nauky, 03028 Kyiv, Ukraine

Abstract. . Analyzed in this work are the requirements to an optical system for laser thermolithographic recording. It has been shown that possibilities of this type recording with decreasing the registered element sizes can be realized only when using special measures for stabilizing both exposing radiation power and duration of laser pulses. Using the thermolithographic method for making super-dense patterns also requires creation of a specific system for dynamic focusing with accuracy better than 100 nm. It has been shown that the specific heat of thermochemical reaction and thermal resistance of a substrate are critical parameters for this method.

Keywords: thermolithography, laser recording, threshold exposure characteristic.

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