Semiconductor Physics, Quantum Electronics & Optoelectronics, 7 (1), P. 088-092 (2004)
https://doi.org/10.15407/spqeo7.01.088


PACS: 42.40.Eq, 42.70.Ln


Recording of high efficiency diffraction gratings by He-Ne laser
V.I. Min'ko, P.E. Shepeliavyi, V.A. Dan'ko, P.F. Romanenko, O.S. Litvin, I.Z. Indutnyy

V. Lashkaryov Institute of Semiconductor Physics, NAS of Ukraine, 41, prospect Nauky, 03028 Kyiv, Ukraine


Abstract. The investigation results of holographic diffraction gratings recording processes by radiation of helium-neon laser have been represented. Inorganic As40S20Se40 photoresist treated by the newly developed selective etching solution was chosen as a registering media. Angular and spectral dependencies of grating diffractive efficiency absolute values were measured. A comparison of fabricated gratings characteristics with corresponding parameters of gratings recorded on As40Se60 photoresist was carried out. Numericall simulation of groove profiles inherent to holographic gratings made in various experimental conditions was performed. Shown is that photoresists based on As40S20Se40 are suitable for production of high quality holographic optical elements.

Keywords: inorganic photoresist, holographic difraction grating, diffraction efficiency, etching solution.
Paper received 14.02.04; accepted for publication 30.03.04.

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