Semiconductor Physics, Quantum Electronics & Optoelectronics. 2007. V. 10, N 1. P. 027-029.
https://doi.org/10.15407/spqeo10.01.027


Using ion beams for creation of nanostructures on the surface of high-stable materials
I.V. Gorbov, V.V. Petrov, A.A. Kryuchyn

Institute for Information Recording, NAS of Ukraine (IPRI NASU) 2, M. Shpak str., 03113 Kyiv, Ukraine 1Phone: (38-044) 454-22-09, fax: (38-044) 241-72-33, e-mail: ivan-gorbov@list.ru
2Phone: (38-044) 454-21-51, fax: (38-044) 241-72-33, e-mail: petrov@ipri.kiev.ua
3Phone: (38-044) 454-21-52, fax: (38-044) 241-72-33, e-mail: ipri@ipri.kiev.ua

Abstract. Main ion-beam etching techniques for creation of nanostructures on the surface of high-stable materials have been considered. Methods of information recording in the form of nanostructure on the metallic substrate surface have been analyzed. Application of glass substrate for creation long-term data carrier was proposed. Microrelief information record on the glass substrate surface was obtained using the ion- beam etching.

Keywords: dry etching technique, ion-beam etching, reactive ion-beam etching, high- stable material, nanostructure, glass substrate, long-term data carrier.

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