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Semiconductor Physics, Quantum Electronics & Optoelectronics. 2007. V. 10, N 1. P. 027-029.
Using ion beams for creation of nanostructures
on the surface of high-stable materials
Institute for Information Recording, NAS of Ukraine (IPRI NASU)
2, M. Shpak str., 03113 Kyiv, Ukraine
1Phone: (38-044) 454-22-09, fax: (38-044) 241-72-33, e-mail: ivan-gorbov@list.ru
Abstract. Main ion-beam etching techniques for creation of nanostructures on the
surface of high-stable materials have been considered. Methods of information recording
in the form of nanostructure on the metallic substrate surface have been analyzed.
Application of glass substrate for creation long-term data carrier was proposed.
Microrelief information record on the glass substrate surface was obtained using the ion-
beam etching.
Keywords: dry etching technique, ion-beam etching, reactive ion-beam etching, high-
stable material, nanostructure, glass substrate, long-term data carrier.
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