Semiconductor Physics, Quantum Electronics & Optoelectronics. 2016. V. 19, N 1. P. 079-083.
DOI: https://doi.org/10.15407/spqeo19.01.079

Electrical and optical parameters of Cu6PS5I-based thin films deposited using magnetron sputtering
I.P. Studenyak1, A.V. Bendak1, V.Yu. Izai1, P.P. Guranich1, P. Kúš2, M. Mikula2, B. Grančič2, M. Zahoran2, J. Gregus2, A. Vincze2, T. Roch2, T. Plecenik2

1Uzhhorod National University, Faculty of Physics, 3, Narodna Sq., 88000 Uzhhorod, Ukraine
2Comenius University, Faculty of Mathematics, Physics and Informatics, Mlynska dolina, 84248 Bratislava, Slovakia, E-mail:studenyak@dr.com

Abstract. Cu6PS5I-based thin films were deposited onto silicate glass substrates by non-reactive radio-frequency magnetron sputtering. The chemical composition of thin films was determined using energy-dispersive X-ray spectroscopy. Electrical conductivity of Cu6PS5I-based thin films was studied as dependent on chemical composition. Optical transmission spectra of Cu5.46P1.68S5.06I0.80 thin film were investigated within the temperature interval 77…300 K; temperature behaviour of optical absorption spectra and dispersion of the refractive index were also studied. Temperature dependences of the energy position of absorption edge, Urbach energy and refractive index of Cu5.46P1.68S5.06I0.80 thin film have been analyzed.

Keywords: thin film, magnetron sputtering, electrical conductivity, optical absorption, refractive index.

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