¹Institute for Information Recording, NAS of Ukraine, 2, Shpak str., 03113 Kyiv, Ukraine
²V. Lashkaryov Institute of Semiconductor Physics, NAS of Ukraine, 41, Nauky ave., 03028 Kyiv, Ukraine
*Corresponding author e-mail: kryuchyn@gmail.com

Abstract. The principles of formation of micro- and sub-microrelief structures using traditional contact lithography exploiting a phototemplate are compared with the approach of direct laser recording. The disadvantage of conventional contact lithography is the phototemplate damage, which limits the number of patterns that can be recorded using it. The perspective of introducing optical-mechanical systems for the microrelief structure formation based on maskless photolithography is outlined. The general principles of a photolithographic system with a spatial light modulator and direct laser recording are analyzed. The technology of maskless photolithography using established circular laser recording technology is presented. Recording systems in polar coordinates have significant advantages over conventional X-Y systems, the movement of the components of the corresponding optical-mechanical system can be controlled with high precision due to the simplification of rotationally symmetric optics. Further optimization of the maskless photolithography method to form submicron structures includes using a beam with a non-Gaussian intensity distribution. A brief literature review of materials for the successful application of maskless (laser) photolithography is provided.

Keywords: maskless photolithography, photoresist, direct laser recording, circular laser recording station, diffraction optical elements.

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