Semiconductor Physics, Quantum Electronics & Optoelectronics, 6 (2), P. 111-114 (2003)
https://doi.org/10.15407/spqeo6.02.111


Semiconductor Physics, Quantum Electronics & Optoelectronics. 2003. V. 6, N 2. P. 111-114.

PACS: 61.72.Tt, 61.80.-x

Thermodonor activation energy and mechanisms of tensoeffects in transmutation-doped g-irradiated silicon
Yu.P. Dotsenko1, V.M. Ermakov1, A.E Gorin1, V.I. Khivrych2, V.V. Kolomoets1, V.F. Machulin1, L.I. Panasjuk4, I.V. Prokopenko1, B.B. Sus'3. E.F. Venger1

1 Institute of Semiconductor Physics, NAS of Ukraine, 45 prospect Nauky, 03028 Kyiv, Ukraine
Phone: +38(044) 265 6280; fax: +38(044) 265 6391; e-mail: kolomoe@class.semicond.kiev.ua
2 Institute of Nuclear Physics, NAS of Ukraine, 47 prospect Nauky, 03028 Kyiv, Ukraine
3 National Taras Shevchenko University of Kyiv, 64 Volodymyrska Street, 01033 Kyiv, Ukraine
4 Institute of Physics, NAS of Ukraine, 46 prospect Nauky, 03028 Kyiv, Ukraine
Phone: +38(044) 266 1073; e-mail: suse@univ.kiev.ua

Abstract. Activation energy of high temperature technological thermodonors (TD) has been determined in transmutation-doped n-Si(P) using the data analysis of the Hall-effect temperature dependence. Physical mechanisms of tensoeffects in n-Si(P) crystals doped by neutron irradiation and doped at growth were studied by the tensoeffects measurements and by analysis of the pressure dependencies of the electron concentration ratio in "upper" and "lower" L1-valleys of uniaxially strained samples. Comparison of the some parameters for the crystals doped either by neutron transmutation method or in the melt is carried out.

Keywords: silicon, transmutation doping, thermodonors, gamma-irradiation.
Paper received 04.03.03; accepted for publication 16.06.03.

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