Semiconductor Physics, Quantum Electronics & Optoelectronics. 2006. V. 9, N 2. P. 001-003.
https://doi.org/10.15407/spqeo9.02.001


Effect of weak magnetic field on structural arrangement of extrinsic oxygen atoms and mechanical properties of silicon monocrystals
V.A. Makara1, L.P. Steblenko1, Yu.L. Kolchenko1, S.M. Naumenko1, I.P. Lisovsky2, D.O. Mazunov2, Yu.Yu. Mokliak2

1Taras Shevchenko Kyiv National University, Physics Department, 2, build 1, Academician Glushkov prospect, 03680 Kyiv, Ukraine Phone: +38 (044) 526-45-37 E-mail: Yu_L_Kolchenko@univ.kiev.ua
2V. Lashkaryov Institute of Semiconductor Physics, NAS of Ukraine 41, prospect Nauky, 03028 Kyiv, Ukraine E-mail: mazunov@isp.kiev.ua

Abstract. IR spectroscopy study is indicative of the change in the relative concentration of interstitial oxygen in silicon monocrystals after their treatment by using the magnetic field. This is an evidence of a considerable effect of magnetic field on the defect structure of the investigated crystals.

Keywords: silicon, magnetic field, IR spectroscopy, oxygen precipitates, interstitial oxygen, microhardness.

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