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Semiconductor Physics, Quantum Electronics & Optoelectronics. 2007. V. 10, N 2. P. 062-071.
Characterization of nanoscaled films on flat and grating substrates
as some elements of plasmonics
V. Lashkaryov Institute of Semiconductor Physics, NAS of Ukraine, 41, prospect Nauky, 03028 Kyiv, Ukraine
Phone: (38044) 525 65 46; fax: (83044) 525 82 43; e-mail: Sosnova@isp.kiev.ua
Abstract. The optical properties of multilayer structures consisting of dielectric,
conductivity-oxide and nanoscaled metal layers, deposited on the planar substrates
(witness samples) and surface relief ones (diffraction gratings) with micro- and nanoscale
sizes, are investigated by AFM, spectral ellipsometry (SE), and photometric techniques.
The SE-measured parameters are related to actual characteristics of the layers when
specified the model of their near-surface regions. Using a parametrization of the layer
dielectric function versus the wavelength and a fitting procedure, the dielectric
parameters are determined. It is shown that the optical constants are affected by both the
substrate morphology and the adjacent medium. Preliminary data about the influence of
isolated particle plasmon excitations in 2D-substrates with the top nanoscaled Au layer
on its optical properties are presented.
Keywords: diffraction grating, nanoscaled film, surface plasmon polariton, plasmonics.
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