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Semiconductor Physics, Quantum Electronics & Optoelectronics. 2014. V. 17, N 2. P. 209-212.
Modification of optical properties and structure of thin films
for enhancing absorption V. Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine Abstract. The most used methods such as ion implantation, laser irradiation and nanosphere lithography for modification and creation of special microrelief of thin absorbing films on photosensitive substrates have been described. Controlled modification of surface structure of the samples for improving their optical properties, especially for enhancing absorption, has many applications in optical devices. The basic things were analyzed from selection of film materials and ways for their further processing to shapes and dimensions of the obtained surface structures. Theoretical modeling methods based on the Mie theory and statistical temporal mode-coupled theory have been used to explain the influence of surface microrelief on optical properties of the samples. Advantages and perspectives for application of the methods have been described and analyzed. Keywords: thin films, light trapping, absorption coatings, surface structure. Manuscript received 14.01.14; revised version received 24.04.14; accepted for publication 12.06.14; published online 30.06.14.
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