¹I. Frantsevich Institute for Problems in Materials Science, NASU, 3, Krzhizhanovskogo str., 03142 Kyiv, Ukraine
²NTUU “Igor Sikorsky Kyiv Polytechnic Institute”, 37, prosp. Peremohy, 03056 Kyiv, Ukraine
³V. Lashkaryov Institute of Semiconductor Physics, NASU, 41, prosp. Nauky, 03680 Kyiv, Ukraine
⁴V. Bakul Institute for Superhard Materials, NASU, 2, Avtozavodska str., 04074 Kyiv, Ukraine
Corresponding author tel.: +38 (095) 5472738; e-mail: liliiamolotovska@gmail.com

Abstract. Cu–Al–O thin films were grown on Si (111) substrates by using the reactive ion-beam sputtering (RIBS) method within the temperature range 80 to 380 °C. The effect of thermal annealing of Cu–Al–O films under various regimes of cooling on the microstructure, morphology, optical properties and photocatalytic activity were examined. The properties of annealed Cu–Al–O films were studied using atomic force microscope (AFM), energy dispersive X-ray spectroscopy (EDX), and Fourier transform infrared spectrometry (FTIR). The X-ray diffraction patterns show appearance only CuAl₂O₄ phase after thermal annealing of Cu–Al–O thin films at 900 °C. Raman scattering confocal measurements have also confirmed the presence of CuO phases in annealed Cu–Al–O samples. AFM results have indicated that the greatest RMS roughness is observed in CuAl₂O₄ films after temperature annealing under the fast cooling regime. Photodegradation of CuAl₂O₄ films was investigated using methyl orange as model pollutant. Present results indicate that CuAl₂O₄ photocatalysts are potential candidate for the practical application in photocatalytic degradation of organic compounds.

Keywords: Cu–Al–O films, XRD, optical properties, FTIR, photocatalytic degradation.

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