https://doi.org/10.15407/spqeo6.04.528
Semiconductor Physics, Quantum Electronics & Optoelectronics. 2003. V. 6, N 4. P. 528-532.
PACS: 42.79.Kr
Vacuum method for creation of liquid crystal
orienting microrelief
Yu. Kolomzarov, P. Oleksenko, V. Sorokin, P. Tytarenko, R. Zelinskyy
V.Lashkaryov Institute of Semiconductor Physics, NAS Ukraine, 41, prospect Nauki, 03028 Kyiv, Ukraine
Abstract. A mechanism for creation of microrelief surface anisotropy of amorphous films oxides materials which are obtained by oblique reactive cathode sputtering method is described. The influence of technological parameters of sputtering on the LC orienting parameters is investigated. The dependencies of the target material, angle of material emission and reemission processes under the substrate negative ion treatment is shown. The application of oblique reactive cathode sputtering method for creation of LCD with differ-ent size is demonstrated.
Keywords: liquid crystal, microrelief, reactive cathode sputtering.
Paper received 11.03.03; accepted for publication 11.12.03.
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