Semiconductor Physics, Quantum Electronics & Optoelectronics. 2007. V. 10, N 4. P. 047-053.
HgCdTe quantum wells grown by molecular beam epitaxy
A.V. Rzhanov Institute of Semiconductor Physics of the Siberian Branch of Russian Academy of Sciences
13, Acad. Lavrent’ev Ave., 630090 Novosibirsk, Russia
Phone, fax: +7-383-330-49-67.
E-mail: dvor@isp.nsc.ru
Abstract. Cd x Hg 1-x Te-based (x = 0 – 0.25) quantum wells (QWs) of 8 – 22 nm in
thickness were grown on (013) CdTe/ZnTe/GaAs substrates by molecular beam epitaxy.
The composition and thickness (d) of wide-gap layers (spacers) were x ∼ 0.7 mol.frac.
and d ∼ 35 nm, respectively, at both sides of the quantum well. The thickness and
composition of epilayers during the growth were controlled by ellipsometry in situ. It
was shown that the accuracy of thickness and composition were ∆x = ± 0.002, ∆d =
± 0.5 nm. The central part of spacers (10 nm thick) was doped by indium up to a carrier
concentration of ∼10 15 cm
−3 . A CdTe cap layer 40 nm in thickness was grown to protect
QW. The compositions of the spacer and QWs were determined by measuring the Е 1 and
Е 1 +∆ 1 peaks in reflection spectra using layer-by-layer chemical etching. The galvano-
magnetic investigations (the range of magnetic fields was 0 – 13 T) of the grown QW
showed the presence of a 2D electron gas in all the samples. The 2D electron mobility
µ e = (2.4 – 3.5)×10 5 cm 2 /(V·s) for the concentrations N = (1.5 – 3)×10 11 cm
−2 (x < 0.11)
that confirms a high quality of the grown QWs.
Keywords: molecular beam epitaxy, mercury cadmium telluride HgCdTe, quantum well,
ellipsometry, infrared spectroscopy, quantum Hall effect.
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