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Semiconductor Physics, Quantum Electronics & Optoelectronics. 2007. V. 10, N 4. P. 087-093.
Analysis of methods for high-speed forming
the relief microimages on metallic substrates
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Abstract. The use of methods of ion and electrochemical etching of metallic substrates
to obtain relief microstructures with micron and submicron sizes is considered. Presented
are the results of experimental researches of processes aimed at manufacturing metallic
carriers by using inorganic photoresists.
Keywords: nickel stamper, metallic carrier, optical read-out, data storage, compact disk,
electroforming, chalcogenide glass.
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