Semiconductor Physics, Quantum Electronics & Optoelectronics. 2007. V. 10, N 4. P. 087-093.

Analysis of methods for high-speed forming the relief microimages on metallic substrates
A.A. Kryuchyn, A.V. Pankratova, I.A. Kassko, A.V. Nagorny, D.V. Chirkov

Institute for Information Recording, NAS of Ukraine 2, Shpak str., 03113Kyiv, Ukraine E-mail: kryuchin@ipri, Phone +380(044)454-2152; fax +380(044)241-7233

Abstract. The use of methods of ion and electrochemical etching of metallic substrates to obtain relief microstructures with micron and submicron sizes is considered. Presented are the results of experimental researches of processes aimed at manufacturing metallic carriers by using inorganic photoresists.

Keywords: nickel stamper, metallic carrier, optical read-out, data storage, compact disk, electroforming, chalcogenide glass.

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