Semiconductor Physics, Quantum Electronics & Optoelectronics. 2012. V. 15, N 4. P. 321-327.
DOI: https://doi.org/10.15407/spqeo15.04.321

Mechanical scanning probe nanolithography: modeling and application
P.M. Lytvyn1, O.S. Lytvyn1, O.M. Dyachyns’ka1, K.P. Grytsenko1, S. Schrader2, I.V. Prokopenko1

1 V. Lashkaryov Institute of Semiconductor Physics NAS of Ukraine, 41, prospekt Nauky, 03028 Kyiv, Ukraine
2 Institute of Photonics, Laser and Plasma Technology, University of Applied Sciences Wildau, F.-Engels-Str. 63, 15745, Wildau, Germany

Abstract. . The paper presents a study on modeling the mechanical interaction between the tip of a scanning atomic force microscope (AFM) and surfaces of various types, which makes it possible to optimize parameters and modes for mechanical AFM nanolithography. The practical assessment of mechanical nanoprobe lithography based on the method of a direct surface patterning was carried out during fabrication of functional elements for molecular electronics. Polymethine dye nanowires of a specified configuration and the cross-section 3×20 nm have been successfully formed in a multilayer polytetrafluoroethylene/gold/silicon nanostructure.

Keywords: scanning probe microscope, nanolithography, nanostructures.

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