Semiconductor Physics, Quantum Electronics & Optoelectronics, 23 (4), P. 393-399 (2020).

Studying the polymerization efficiency of photosensitive compositions by using the surface plasmon resonance method
V.M. Granchak1, V.G. Sysyuk2, H.V. Dorozinska3, V.P. Maslov4, G.V. Dorozinsky4, O.O. Kudryavtsev4, N.V. Kachur4

1L. Pisarzhevskii Institute of Physical Chemistry, NAS of Ukraine
31, prospect Nauky, 03028 Kyiv, Ukraine
2Institute of Macromolecular Chemistry, NAS of Ukraine
48, Kharkivske shose, 02160 Kyiv, Ukraine
3National Technical University of Ukraine “Igor Sikorsky Kyiv Polytechnic Institute”
37, prospect Peremohy, 03056 Kyiv, Ukraine
4V. Lashkaryov Institute of Semiconductor Physics, NAS of Ukraine
41, prospect Nauky, 03680 Kyiv, Ukraine

Abstract. In a real-time scale, it has been investigated the polymerization process in photosensitive compositions based on oligourethanacrylates with various concentrations of photoinitiators by using the method of surface plasmon resonance. Experimentally determined were the speed of polymerization and induction period for the studied samples of photopolymerization compositions as well as their optimum ratio of components for the chosen illumination wavelength 407 nm. It has been ascertained that with increasing the concentration of photoinitiators Irgacure 651 and Irgacure 819 from 1 up to 2% the speed of polymerization is increased by 3 and 7 times, respectively, while the induction period is decreased by almost 2 and 10 times, respectively. The presence of Irgacure 819 in these compositions provides the highest polymerization speed and the lowest induction period, which is related with the optimal choice of the illumination source wavelength inside the absorption spectrum of initiator, and the competitive absorption in other components of the photopolymer composition is minimal. These investigations are useful for developing optimal compositions of the studied materials for using them in various branches of industry.

Keywords: surface plasmon resonance, refraction index, photosensitive composition, photopolymerization, photoinitiator.

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